Deposition Thin Films or Grow Nanowire Used PE-CVD Tube Furnace System
TCH-OTF-1200X-PEC4LV is a CE certified compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 300W RF plasma source, 2" or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump. The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid state, and benefits:
- Lower temperature processing compared to conventional CVD.
- Film stress can be controlled by high/low frequency mixing techniques.
- Control over stoichiometry via process conditions.
- Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.
Specification of the deposition thin films or grow nanowire used PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system
Split Tube furnace
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- 1200oC Max. working temperature for < 60 minutes
- 1100oC Max for continuous heating
- 30 segments programmable precision digital temperature controller
- 440 mm length single heating zone and 150 mm length constant temperate zone
- High purity quartz tube optional
One pair of vacuum sealed flange with valves
- 2"OD x 1.7"ID x 48" Length
- 3.14"OD x 2.83"ID x 48'' Length
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- Input power: 208 – 240V AC input, single phase at max. 4KW
- Two zones split furnace -OTF1200X-II is optional at extra cost
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Plasma RF Power Supply
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- Output Power: 5 -300W adjustable with ± 1% stability
- RF frequency: 13.56 MHz ±0.005% stability
- Reflection Power: 200W max.
- Matching: Automatic
- RF Output Port: 50 Ω, N-type, female
- Noise: <50 dB.
- Cooling: Air cooling.
- Power: 208-240VAC, 50/60Hz
- Note: This RF power supply can accept 50 - 80 mm Max. quartz tube by changing flange
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Anti-corrosive Pressure Gauge
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- 3.8x10-5 to 1125 Torr measurement range
- Anti-corrosive, gas-type independent
- High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection
- Fast atmospheric detection eliminates waiting time and shortens process cycle
- Easy to exchange plug & play sensor element
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Vacuum Pump and valve
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- Heavy Duty Rotary Vane Vacuum Pump (7.8 CFM -240 L/m) with Two Stage Exhaust System installed in the bottom case with max. vacuum pressure 10-2 torr.
- KFD25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve
- Digital vacuum pressure gauge and display are installed with the furnace
Option: For precise control of the vacuum pressure, we recommend you choose our turn-key solution EQ-VPC-MV. This is a vacuum pressure regulating system with motorized valve and gauge. It controls pressure range from 10^-6 torr ~ 760 torrs. |
Optional Oilless Pump |
Please order the oilless pump for zero contamination: |
Mass Flowmeter
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- 4-Channelled Gas Mixing
- Made of 316 stainless steel valve
- Gas mixing tank: Φ80X120mm
- 600mm(L) x 745mm(W) x 700mm(H)
- 23W per channel
- AC 220V/50Hz Single phase
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Temperature Controller |
- MET certified 30 programmable segments for precise control of heating rate, cooling rate and dwell time.
- Built in PID Auto-Tune function with overheating & broken thermocouple protection.
- Over temperature protection and alarm allows for operation without attendant(s).
- +/- 1 ºC temperature accuracy.
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Optional
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bubbler or evaporator for CVD
Constant temperature control module
crucible |
Overall dimensions |
- Furnace: 550mm(L) x 380mm(W) x 520mm(H)
- 2 Bottom Mobile case together: 1200mm(L) x 1200mm(W) x 1200mm(H)
- Net weight: 220 lbs
- Shipping weight: 350 lbs
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Warranty |
One year limited warranty with lift time support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty, please order the replacement at related products below.) |
Compliance
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Patten Number: ZL-2011-2-0355777.1 |
Warning
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- The tube furnaces with quartz tube are designed for using under vacuum and low pressure < 0.2 bars / 3 psi / 0.02 Mpa
- Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Click here to learn the installation of a gas regulator.
- Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C
- The flow rate for gasses should be limited to<200 SCCM (or 200ml/min) for reducing thermal shocks to the tube
- we reserve right to modify PECVD design at any time without notice but promise that quality will meet the specifications above
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Shipping Dimensions |
- Pallet #1: 48" x 40" x 60"
- Pallet #2: 48" x 40" x 40"
- Pallet #3: 48" x 40" x 40"
- Pallet #4: 48" x 40" x 40"
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Total Shipping Weight |
500 kg (1100 lbs) |
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reference picture of the deposition thin films or grow nanowire used PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system
other lab tube furnaces for your choice:
Company Information
Zhengzhou TCH Instrument Co., Ltd. is established with the goal of providing researchers with specialized instruments designed to meet their unique demands. We has grown into one of the material science market’s sources of quality instruments overseas. Although the work of the research community has changed quite a bit over the last years,Zhengzhou TCH Instrument Co., Ltd , through constant innovation, continues to provide the highest-quality instruments and unparalleled service, to meet and exceed all of our customers’ needs.
Zhengzhou TCH Instrument Co., Ltd is a leading developer of lab instruments and related products. Our products are used by lab research professionals worldwide. Throughout our history Zhengzhou TCH Instrument Co., Ltd has been synonymous with quality.
Contact Email: tchinstrumenttch(at)163.com
Mobile: 0086 18135778330